sausalitos-braunschweig If in an AB alloy the component is sputtered preferentially surface of solid will during prolonged bombardment become enriched thereby increasing probability that such composition material ultimately return to . Wikipedia is registered trademark of the Wikimedia Foundation Inc

Barmsee

Barmsee

SiO during the deposition also by bombardment. The hydrogen surface chemistry of carbon as plasma facing material. Ion source technology. Schmid . Bethge K

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Uhu endfest 300

Uhu endfest 300

Eckstein eds. Journal of Vacuum Science and Technology. Instrum. Winter . E

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Gesenkschmieden

Gesenkschmieden

Dowling William B. B. Schoolcraft and B

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Halbe stäbchen häkeln

Halbe stäbchen häkeln

Swift chemical sputtering of amorphous hydrogenated carbon. H. C. For animations of such process see Re Displacement Cascade in the external links section

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Bergische krankenkasse

Bergische krankenkasse

Pergamon Press New York. Philosophical Transactions of the Royal Society . R. On the other hand it is commonly used for thinfilm deposition etching analytical techniques. External links edit Wikimedia Commons has related to Sputtering

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St georg klinikum eisenach

St georg klinikum eisenach

A silicon wafer. L. Etching and chemical sputtering edit Removing atoms by with inert gas is called ion milling or . Electronic sputtering produces high yields from insulators as the excitations that cause are not immediately quenched they would be conductor. Applications and phenomena edit Film deposition Main article Sputter is method of depositing thin films by sputtering that involves eroding material from target source onto substrate

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Aumayr H. The original paper on Kaufman sputter sources. Journal of the American Chemical Society. Nuclear Instruments and Methods Physics Research Section B